N-type monocrystalline silicon wafers
0.6-1.6 <Ω·cm>
Resistivity
≤12 <ppma>
Oxygen content
≤1 <ppma>
Carbon content
≥800 <µs>
Lifetime
Material properties
Item
Specifications
Test Method
Growth method
Czochralski technique
--
Crystallinity
Monocrystalline
--
Conductive type
N-Type
PN testing machine
Dimensions
M10:182.2*182.2*φ247mm
G12:210*210*φ295mm
G12-R:182.3*210*φ272mm
AOI
Thickness
M10:90-160µm
G12:90-160µm
G12-R:90-160µm
AOI
Item | Specifications | Test Method |
---|---|---|
Growth method | Czochralski technique | -- |
Crystallinity | Monocrystalline | -- |
Conductive type | N-Type | PN testing machine |
Dimensions | M10:182.2*182.2*φ247mm G12:210*210*φ295mm G12-R:182.3*210*φ272mm |
AOI |
Thickness | M10:90-160µm G12:90-160µm G12-R:90-160µm |
AOI |
Electrical properties
Item
Specifications
Test Method
Resistivity
0.6-1.6<Ω·cm>
AOI
Lifetime
≥800<µs>
BCT-400
Oxygen content
≤12<ppma>
FTIR (ASTM F121-83)
Carbon content
≤1<ppma>
FTIR (ASTM F123-91)
Item | Specifications | Test Method |
---|---|---|
Resistivity | 0.6-1.6<Ω·cm> | AOI |
Lifetime | ≥800<µs> | BCT-400 |
Oxygen content | ≤12 |
FTIR (ASTM F121-83) |
Carbon content | ≤1 |
FTIR (ASTM F123-91) |
Contact Us
Gokin provides you with professional consulting services, N-type silicon wafer product information, photovoltaic industry business models, and full lifecycle operation and maintenance capabilities. Please feel free to call us.
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0756-6836188
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